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Low-temperature plasma treatment has been used in the last years as a useful tool to modify the surface properties of different materials, in special of polymers. In the present work low temperature plasma was used to treat the surface of asymmetric porous substrates of polysulfone (PSf) membranes. The main purpose of this work was to study the influence of the exposure time and the power supplied to argon plasma on the permeability properties of the membranes. Three rf power levels, respectively 5, 10 and 15 W were used. Treatment time ranged from 1 to 50 min. Reduction of single gas permeability was observed with Ar plasma treatments at low energy bombardment (5 W) and short exposure time (20 min). Higher power and/or higher plasma exposition time causes a degradation process begins. The chemical and structural characterization of the membranes before and after the surface modification was done by AFM, SEM and XPS.

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