An antireflection moth-eye structure was fabricated on a glass substrate by ultraviolet nanoimprint lithography (UV-NIL). A Ni template with an artificial conical structure was fabricated by laser interference lithography an used as a stamp for embossing. A transparent PVC template was fabricated by hot embossing. The embossed poly(vinyl chloride) (PVC) film was then used as an imprint template after depositing SiO 2 and a self-assembled monolayer (SAM). Using the embossed PVC film as a UV-NIL stamp, a polymer based moth-eye structure was formed on the glass template and its transmittance, parallel to surface normal, was increased to 93% for a single side patterned and 97% for a double side patterned. However, at wavelengths shorter than 430 nm, the transmittance of 30 -rotated glass substrate with a moth-eye structure became lower than that of the bare glass substrate, while the transmittance was not changed for longer wavelength regions.

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The indium tin oxide (ITO) transparent electrode layer on green and blue light-emitting diodes (LEDs) was patterned with various-sized periodic hole arrays, size ranging from 300 nm to 380 nm, using thermal nanoimprint lithography and inductively coupled plasma (ICP) etching processes. The imprinted resin was used as a mask layer and etch resistance of the imprinted resin was adjusted in order to control the tapered and enlarged etch profile of the ITO layer, since the tapered etch profile can improve the light extraction efficiency of the LED by prominent scatterings. Photoluminescence intensity from InGaN multi-quantum wells for the green LED structure showed that up to 4.6 times stronger emission was exhibited with the patterned ITO electrode, compared to the identical sample with an un-patterned blanket ITO electrode layer. An electroluminescence (EL) intensity of a blue LED sample witha patterned ITO electrode layer was increased up to 23% compared to that of the identical sample with an un-patterned blanket ITO electrode layer.