Full wafer scale nanoimprint lithography for GaN-based light-emitting diodes

Byeon, Kyeong Jae; Hong, Eun Ju; Park, Hyoungwon; Cho, Joong Yeon; Lee, Seong Hwan; Jhin, Junggeun; Baek, Jong Hyeob; Lee, Heon

doi:10.1016/j.tsf.2010.10.039

Cited by 23 publications

(12 citation statements)

References 26 publications

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“…Moreover, it has become a perfect match for some emerging application fields that are in great need of largearea patterning of submicro and nanoscale features at a low cost, such as patterned magnetic media, high-brightness light-emitting diodes (HB-LEDs), anti-reflective coatings or films, flexible electronics, printed electronics, OLED, wire grid polarizer, flat panel display, microfluidic devices, etc. In particular, this technique has demonstrated great commercial prospects in several market segments, HB-LEDs, anti-reflective coatings or films with moth-eye structures, flexible electronics, solar cells, architectural glass, WGP, optical elements, patterned media, micro-lens arrays, and functional polymer devices [1][2][3][4][5][38][39][40][41]. Large-Area Nanoimprint Lithography and Applications http://dx.doi.org/10.5772/intechopen.72860…”

Section: Applications Of Large-area Nilmentioning

confidence: 99%

Large-Area Nanoimprint Lithography and Applications

Lan¹

2018

Micro/Nanolithography - A Heuristic Aspect on the Enduring Technology

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Large-area nanoimprint lithography (NIL) has been regarded as one of the most promising micro/nano-manufacturing technologies for mass production of large-area micro/ nanoscale patterns and complex 3D structures and high aspect ratio features with low cost, high throughput, and high resolution. That opens the door and paves the way for many commercial applications not previously conceptualized or economically feasible. Great progresses in large-area nanoimprint lithography have been achieved in recent years. This chapter mainly presents a comprehensive review of recent advances in largearea NIL processes. Some promising solutions of large-area NIL and emerging methods, which can implement mass production of micro-and nanostructures over large areas on various substrates or surfaces, are described in detail. Moreover, numerous industriallevel applications and innovative products based on large-area NIL are also demonstrated. Finally, prospects, challenges, and future directions for industrial scale largearea NIL are addressed. An infrastructure of large-area nanoimprint lithography is proposed. In addition, some recent progresses and research activities in large-area NIL suitable for high volume manufacturing environments from our Labs are also introduced. This chapter may provide a reference and direction for the further explorations and studies of large-area micro/nanopatterning technologies.

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Section: Applications Of Large-area Nilmentioning

confidence: 99%

Large-Area Nanoimprint Lithography and Applications

Lan¹

2018

Micro/Nanolithography - A Heuristic Aspect on the Enduring Technology

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“…Physical properties of Ormostamp are modulus of elasticity of 0.650 GPa, hardness of 0.036 GPa, liquid viscosity of 0.75 Pa s. The values of Ormocomp modulus of elasticity and hardness are sufficient for patterning both micro-and nanostructures without any cracks and fractures (too brittle material) or deformations (too soft material). In addition, the relatively low viscosity of Ormostamp is important for efficient filling of the master template cavities and allows various deposition techniques, which make the material handling and further processing easier [12,[63][64][65]. The Ormostamp working mold possesses high transparency and thermal and UV stability which are essential for soft UV-NIL.…”

Section: Uv-curable Inorganic-organic Hybrid Polymer -Ormostampmentioning

confidence: 99%

“…Therefore, soft UV-NIL has been considered as one of the most suitable solution for LED patterning. Due to its cost-effectiveness combined with superior processing performance, soft UV-NIL will play a crucial role in moving the LED industry into a new realm of nanopattered LEDs with ultra-high efficiency [2,14,17,65]. Figure 9 showed some cases related to LED patterning using soft UV-NIL.…”

Section: Led Patterningmentioning

confidence: 99%

Soft UV Nanoimprint Lithography and Its Applications

Lan¹

2013

Updates in Advanced Lithography

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Additional information is available at the end of the chapter http://dx.doi.org/10.5772/56186 . IntroductionLarμe-area nanopatterninμ tecνnoloμy νas demonstrated νiμν potential wνicν can siμniλi-cantly enνance tνe perλormance oλ many devices and products, sucν as LEDs, solar cells, νard disk drives, laser diodes, display, etc [ ]. For example, nano-patterned sappνire substrates NPSS and pνotonic crystals PνC νave been considered as tνe most eλλective approacνes to improve tνe liμνt output eλλiciency internal quantum eλλiciency and external quantum eλλiciency oλ LEDs and beam sνapinμ [ , ]. Tνe solar cells witν sub-micro anti-reλlective coatinμ exνibited νiμνer pνotocurrent and νiμνer power conversion eλλiciency compared to tνose witνout nanostructures [ ]. Moreover, tνe ability to produce larμe-area micro-and nanostructures on non-planar surλaces is oλ importance λor many applications sucν as optics, optoelectronics, nanopνotonics, imaμinμ tecνnoloμy, NEMS, and microλluidics [ ]. However, creatinμ larμe-area nanostructures on curved or non-planar surλaces are extremely diλλicult usinμ existinμ patterninμ approacνes. Furtνermore, a variety oλ existinμ nanopatterninμ tecνnoloμies sucν as electron beam litνoμrapνy EL" , optical litνoμrapνy, interλerence litνoμrapνy IL , etc., cannot cope witν all tνe practical demands oλ industrial applications witν respect to νiμν resolution, νiμν tνrouμνput, low cost, larμe area, and patterninμ on nonλlat and curved surλace. Tνereλore, new νiμν volume nanomanuλacturinμ tecνnoloμy stronμly needs to be exploited and developed so as to meet tνe tremendous requires oλ rapid μrowinμ markets.Nanoimprint litνoμrapνy NIL νas now been considered as a promisinμ nanopatterninμ metνod witν low cost, νiμν tνrouμνput and νiμν resolution, especially λor producinμ tνe larμe-area micro/nano scale patterns and complex -D structures and as well as νiμν-aspect-ratio λeatures. Due to tνese outstandinμ advantaμes, it was accepted by International Tecνnoloμy Roadmap λor Semiconductors ITRS in λor tνe and nm nodes, scνeduled λor industrial manuλacturinμ in . Tosνiba νas validated NIL λor nm and beyond. NIL νas also been listed as one oλ emerμinμ tecνnoloμies tνat will stronμly impact tνe world by Compared to otνer NIL processes tνermal NIL or νot embossinμ, UV-NIL witν riμid mold and nanopatterninμ metνods, soλt UV-NIL usinμ a λlexible or soλt mold νas been proven to be a very promisinμ approacν λor makinμ larμe-area patterns up to waλer-level in tνe micrometer and nanometer scale, λabricatinμ -D micro/nano structures and νiμν-aspect-ratio λeatures, especially producinμ larμe-area patterns on tνe non-planar surλaces even curved substrates at low-cost and witν νiμν tνrouμνput. Since tνe soλt mold stamp, template is adopted, tνe soλt UV-NIL process νas some unique advantaμes compared witν tνe traditional UV-NIL witν riμid mold. Tνese strenμtνs include Cost reduction. Cνeap soλt molds can be easily replicated λrom one expensive master, siμniλicantly reducinμ cost oλ tνe master template λabrication.Conλorma...

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“…Moreover, a flexible substrate and a curved substrate can be patterned by NIL process [128][129][130][131][132][133]. These application fields include organic and inorganic thin film transistors (TFTs) [134][135][136][137][138][139], optical elements and film for various displays [140][141][142], light-emitting devices including LEDs and OLEDs [143][144][145][146][147][148][149][150][151][152], patterned magnetic media [153,154], next-generation random access memory (RAM) devices including resistive RAM and phasechange RAM [155][156][157][158][159][160][161][162][163], and organic and thin film solar cells [164][165][166][167][168]. Various types of nano-and microstructures including one-, two-and three-dimensional structures have been fabricated by NIL and have been applied to diverse devices to enhance the overall performance.…”

Section: Applicationsmentioning

confidence: 99%

Recent progress in direct patterning technologies based on nano-imprint lithography

Byeon

Lee

2012

Eur. Phys. J. Appl. Phys.

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Abstract. Nano-imprint lithography (NIL) is one of the most promising patterning technologies, in which nano-and micro-patterns are fabricated on various substrates. NIL provides high throughput and low cost in fabricating nano-structures due to its simple process and allows resolution below 10 nm without issues of light diffraction with conventional lithographic techniques. Its patterning mechanism is based on mechanical deformation of a polymer resist, which is simply done by pressing with a mold. This patterning mechanism also enables inorganic and organic-inorganic hybrid materials to be directly patterned by NIL. This article covers the recent progress of NIL-based direct patterning techniques and their applications to devices. Recently, functional nano-and micro-patterns have been applied to various electronic devices for the enhancement of overall performance. Fabrication methods of these devices are difficult using conventional lithographic techniques due to complex processes, high cost and low throughput. Direct NIL technique using functional resist can simply fabricate functional nano-and micro-structures and thus can be usefully applied to various industries.

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Full wafer scale nanoimprint lithography for GaN-based light-emitting diodes

Cited by 23 publications

References 26 publications

Large-Area Nanoimprint Lithography and Applications

Large-Area Nanoimprint Lithography and Applications

Soft UV Nanoimprint Lithography and Its Applications

Recent progress in direct patterning technologies based on nano-imprint lithography

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