The optical response of a representative PSMD imaging system, stannous chloride sensitized polyimide film, was determined by exposing sensitized substrates to ultraviolet radiation and measuring the resulting decrease in catalytic activity for electroless copper deposition. This activity was determined by measuring light transmission through the deposited metal and substrate.The imaging reaction photoresponse was measured in the 200–400 nm wavelength range. The sensitivity was found greatest at 200 nm, decreasing monotonically with wavelength. The upper limit for useful imaging in air occurred in the vicinity of 350 nm. The imaging reaction rate was also found proportional to I0.7 , where I is the incident Tight intensity. This intensity dependence was found over the entire range of measured wavelengths. An explanation of the system's optical behavior in terms of light‐generated electronhole pairs is offered.

Das optische Ansprechvermögen eines zur photoselektiven Metallabscheidung geeigneten Systems (mit SnCl2 sensibilisierter Polyimidfilm) wurde durch UV‐ Bestrahlung der Proben und Messung der resultierenden Abnahme ihrer katalytischen Aktivität bei der stromlosen Cu‐Abscheidung untersucht.