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We have developed a technique for fabricating microlens arrays by engraving photoresist coatings. These microlens arrays are designed for astronomical applications for atmospheric wavefront sensors.First, we describe the apparatus and the manufacturing proce. Sond, we review the characteristics of the different pbotoresist types used in this process. Third, we report on the different optical testing methods to nasure the microlens'performances. Then we deduce the several inherent advantages and limitations of this method.Forth we show bow to produce monolithic arrays using ion beam milling with photoresist inicrolens arrays as pattern and we demonstrate how these arrays can improve upon the performances of photoresist arrays.In conclusion, we point out the advantages and limitations of photoresist microlens arrays and the applications for which they are most suited. 0-81 94-0960-X/93/$4.00 SPIE Vol. 1781 Specification and Measurement ofOptical Systems (1992) / 287 Downloaded From: http://proceedings.spiedigitallibrary.org/ on 06/25/2016 Terms of Use: http://spiedigitallibrary.org/ss/TermsOfUse.aspx

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Semitransparent SI photocathodes have been developed on a low-resistivity Sn0 2 layer for streak camera image converter tubes. The SO-!J /0 resistivity combined with good photocathode sensitivity prevents parasitic effects and provides an efficient diagnosis tool for 1.06-Jl m laser-plasma interaction experiments. Furthermore, the lifetime in the I-Jl m range has been greatly increased by a rebaking process which may reestablish the 1.06-Jl m sensitivity. PACS numbers: 8S.60.Gz, 42.80.Qy, 07.68. + m =--=~~~~~t-I';'ofocafhode oHt---gNd n' 1 grid n';' anode tnL ___ t-~==tjrfluorescent screen FJG. I. Cross section of the P500 S tube structure provided by R TC. 161Rev.