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The kinetics of silicide growth are classified into three different categories: (a) diffusion controlled, (b) nucleation controlled, (c) others (reaction rate controlled). These are analyzed with the aim of understanding both the phenomenology of growth and the specific atomic mechanisms of phase formation. Diffusion-controlled growth is discussed with respect to the Nernst-Einstein equation. Stress relaxation is considered as a possible cause of reaction-rate control. The relative merits of two different types of marker experiments are compared. A few silicides are discussed in terms of what can be inferred about diffusion mechanisms. The competition between reaction-rate and diffusion control phenomena is shown to have specific effects on the sequence of phase formation; it is also related to the formation of some amorphous compounds. Reactions between silicon and alloyed metal films are used to illustrate the respective influences of mobility and driving force factors on the kinetics of silicide growth; they can also be used to underline the dominance of nucleation over diffusion in some silicide formation processes.

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The reactions of metal layers with their silicon substrates resulting in the formation of various silicides are considered generally not only as phenomena common to all diffusion couples where new phases are formed, but also as typical of all transitions from two to three phases. The conditions under which such transitions will display the same characteristics as encountered in the usual one-to-two phase transitions (condensation, crystallization, boiling) are analyzed by comparison to the classical theory of nucleation. Because of the lack of knowledge about the exact values of the relevant parameters, the discussion is carried out mostly in descriptive thermodynamic terms. Although nucleation effects are analyzed in general terms, the main focus of attention is a class of reactions where nucleation dominates the formation of a new phase; a salient feature of these reactions is the absence of any equilibrium temperature, although the nucleation temperatures are relatively well defined within narrow limits. Nucleation effects are correlated to such material characteristics as the stability of the nucleated phases, and to such kinetic characteristics as the sequence of phase formation. The modification of the energy levels of the different phases brought about by stress, ion bombardment, or the replacement of usual phases by metastable ones, are considered with respect to their effect on nucleation processes. The nearly total absence of literature references to nucleation in metal-metal diffusion couples is discussed with respect to some specific aspects of the metal-silicon reactions.