Electroabsorption measurements are reported for wurtzite InGaN/GaN quantum wells. The electroabsorption technique allows exact quantitative analysis of absorption and absorption changes in InGaN quantum wells and barrier layers, with recorded field-induced absorption changes as large as 7000 cm Ϫ1 below and almost 20000 cm Ϫ1 above the band edge. The technique thus allows precise determination of the strong internal fields that originate from strain-induced polarization and differences in spontaneous polarization. The fields measured on functioning diodes vary between 1.1 and 1.4 MV/cm for indium concentrations in InGaN quantum wells ranging from 7% to 9%.

We report on a novel concept for THz photomixers with high conversion efficiency up to several THz. In contrast to the conventional pin photomixer we can overcome the trade-off between either optimizing transit-time or RC-roll-off. Using quasi-ballistic transport in nano-pin-diodes the transport path can be optimized regarding both path length and transit time. Independently, the capacitance can be kept small by using a sufficiently large number of optimized nano-pin-diodes in series. The concept is presented in detail and first experimental results are reported which corroborate our theoretical expectations.

The authors report on photomixing terahertz sources that overcome the transit time versus RC-time trade-off and allow for independent optimization of both of them, using a n-i-p-n-i-p superlattice. Furthermore, they take advantage of ballistic transport for reduced transit times. Apart from more favorable material parameters, In(Al)GaAs photomixers benefit from the advanced telecommunication laser technology around 1.55 mu m as compared to GaAs. In such devices, a terahertz-power output of 1 mu W has been achieved at 0.4 THz at a photocurrent of 3.8 mA. A comparison between corresponding GaAs- and InGaAs-based n-i-p-n-i-p photomixers reveals an improvement of performance by at least an order of magnitude for the latter one. (c) 2007 American Institute of Physics

We report electrical conductivity studies of highly-doped GaAs pn diodes containing a strongly n-doped low-temperature-grown (LT)–GaAs layer and pn junctions containing an approximately one monolayer thick ErAs layer. At room temperature, current densities of 1 kA/cm2 for the n-LT–GaAs samples and 6 kA/cm2 for the ErAs samples at 1 V forward bias have been measured. The I–V characteristics under forward bias for the n-LT–GaAs and ErAs samples exhibit significantly different behavior. At low temperatures, the n-LT–GaAs samples reveal a shoulder in the I–V characteristics, which can be explained by a model taking into account tunneling of carriers into LT midgap states. A similar model was able to explain the current transport in the ErAs diodes as tunneling of carriers into metallic regions inside the pn junction.

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