No abstract

No abstract

Nano TiO2 thin films on glass substrates were prepared at a constant temperature of (373 K) and base vacuum (10-3 mbar), by pulsed laser deposition (PLD) using Nd:YAG laser at 1064 nm wavelength. The effects of different laser energies between (700-1000)mJ on the properties of TiO2 films was investigated. TiO2 thin films were characterized by X-ray diffraction (XRD) measurements have shown that the polycrystalline TiO2 prepared at laser energy 1000 mJ. Preparation also includes optical transmittance and absorption measurements as well as measuring the uniformity of the surface of these films. Optimum parameters have been identified for the growth of high-quality TiO2 films.

In this Work, Laser energy effects on optical and morphological properties of TiO 2 thin film has been carried out using Reactive Pulsed Laser as a Deposition technique (RPLD). Q-switched Nd-YAG laser with ( λ =1.06µm, t =7nsec) and different energies have been used to ablate pure Titanium target and deposited thin films on glass substrates with constant substrate temperature of (343K). The optical properties of the films prepared include Optical transmit ion and absorption measurement, surface uniformity measurement and FTIR structure of these films. The results films show that high transparency reached to about (85-98) % can be achieved with TiO 2 film which itself decreases sharply with the increasing of Laser energy while the optical band gap is (3.7-3.9) eV at optimum Laser energy in all results (800mJ), the FTIRstructure result at 800 mJ is the optimum and peaks absorption of TiO 2 are (408.91, 439.77, 524.64) cm -1 .