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Among other the planarization technologies, Chemical mechanical planarization (CMP) is the unique global planarization technology, which makes it be continuously investigated. The planarization (polishing) and micromachining are of considerable interest to different engineering fields, such as the friction couples that function with the selective transfer and is used to remove excess of metal, obtained in process of selective transfer and for the understanding of planarization and micromachining. For an effective planarization, it is necessary to minimize the surface defects while attaining a good planarity with optimal material removal rate (MRR). These requirements can be met by controlling the chemical and mechanical interactions during the polishing process, or by engineering the slurry chemistry, particles properties, and stability. Effect of the etching during CMP process of the selective layer surface are presented in this paper. To optimize the process of selective layer CMP a blanket selective layer samples were polished with, colloidal silica-based slurry which contains a citric acid and an oxidizer (H 2 O 2 ). Surface studies using X-ray photoelectron spectroscopy (XPS) were performed on selective layer samples after chemical etching in order to determine the effect that different polishing parameters (i.e., pH and H 2 O 2 concentration) have on the selective layer surface. Then, the samples were passively soaked in an acidic slurry mixture containing different concentrations of H 2 O 2 to determine how the chemical action alone affects the removal of the selective layer. The etching results revealed that a cuprous oxide (Cu 2 O) forms on the surface of the etched metallic selective layer while polished samples showed CuO and Cu(OH) 2 . The effect of these selective layer oxide films on the removal of the selective layer in passive etching and CMP is discussed.

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