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We report the development of a new microstereophotolithography technique for creation of three-dimensional microcomponents by use of a planar, layer-by-layer process of exposure, in which a spatial light modulator is used as a dynamic lithographic mask. The system operates in the UV to take advantage of the wide supply of commercially available photopolymers designed for conventional stereolithography. With this novel procedure it is possible to build components with feature sizes as small as a few micrometers. The experimental setup is briefly described, and the first microcomponent fabricated by this system is shown.

We present the implementation of a clutter-tolerant filter in a hybrid correlator system. Wiener filters were mapped with a complex encoding technique onto a smectic A(*) liquid-crystal spatial light modulator (SLM). The technique overcomes the problem of representing high-dynamic-range data on SLM's that have limited modulation capabilities. It also provides a compact image recognition system that is robust enough for many real-world applications. Experimental results are presented.

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The design of a digital-optical hybrid correlator is detailed. The design of the optical-Fourier-transform lens and the mechanical lens housing are detailed, as well as the video-rate fast-Fourier-transform digital signal-processing hardware and overall electronic control. Example results using several different filters and modulation techniques are described.