There are various data mining and analysis tools in use by high-volume semiconductor manufacturers throughout the industry that seek to provide robust monitoring and analysis capabilities for the purpose of maintaining a stable lithography process. These tools exist in both online and offline formats and draw upon data from various sources for monitoring and analysis. This paper explores several possible use cases of run-time scanner data to provide advanced overlay and imaging analysis for scanner lithography signatures. Here we demonstrate several use-cases for analyzing and stabilizing lithography processes.Applications include high order wafer alignment simulations in which an optimal alignment strategy is determined by dynamic wafer selection, reporting statistics data & analysis of the lot report and the sub-recipe as a sort of non-standard lot report, visualization of key lithography process parameters, and scanner fleet management (SFM)

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