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Hydrogen-containing amorphous carbon films were produced from CH,I, by photolytical laser assisted chemical vapour deposition at room temperture. An Ar+ laser operated in the ultraviolet spectral region (351 and 364 nm) was used as the excitation source. The beam was focused in parallel to the Si(lOO) substrate. The deposition process was studied for different partial pressures of CH,I2 and for different heights of the laser beam above the substate surface. The mass thickness of the film was determined by energy dispersive X-ray spectrometry. The hydrogen content of the carbon films was determined by nuclear reaction analysis and the iodine content in the films was obtained by Auger electron spectroscopy and energy dispersive X-ray spectrometry. Carbon hybridization was investigated by Raman and infrared spectroscopy while morphology was examined by atomic force microscopy.

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