A multistep pulsed-laser deposition (PLD) process is presented for epitaxial, nominally undoped ZnO thin films of total thickness of 1 to 2 μm on c-plane sapphire substrates. We obtain reproducibly high electron mobilities from 115 up to 155 cm2/V s at 300 K in a narrow carrier concentration range from 2 to 5×1016 cm−3. The key issue of the multistep PLD process is the insertion of 30-nm-thin ZnO relaxation layers deposited at reduced substrate temperature. The high-mobility samples show atomically flat surface structure with grain size of about 0.5–1 μm, whereas the surfaces of low-mobility films consist of clearly resolved hexagonally faceted columnar grains of only 200-nm size, as shown by atomic force microscopy. Structurally optimized PLD ZnO thin films show narrow high-resolution x-ray diffraction peak widths of the ZnO(0002) ω- and 2Θ-scans as low as 151 and 43 arcsec, respectively, and narrow photoluminescence linewidths of donor-bound excitons of 1.7 meV at 2 K.

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La 0.7 Ca 0.3 MnO 3 films with thicknesses between 2 and 300 nm were fabricated on LaAlO3, SrTiO3, and (LaAlO3)0.3(Sr2AlTaO6)0.7 (LSAT) substrates using pulsed laser deposition. After annealing at 950 °C in flowing oxygen, on LaAlO3 and LSAT, strain-relaxed epitaxial films of high quality were obtained. The magnetization, resistivity, and magnetoresistance of the films was studied as a function of thickness. Down to a thickness of about 4 nm no decrease of the saturation magnetization could be detected; the Curie temperature decreases slightly with thickness in agreement with finite size scaling theory. The thickness dependence of the conductance can be understood as a size-effect in thin films; there is no indication of an electrically dead interfacial layer.

The optical dielectric functions for polarization perpendicular and parallel to the c-axis (optical axis) of pulsed-laser-deposition grown wurtzite MgxZn1−xO (0⩽x⩽0.29) thin films have been determined at room temperature using ellipsometry for photon energies from 1 to 5 eV. The dielectric functions reveal strong excitonic contributions for all Mg concentrations x. The band gap energies (E0A=3.369 eV for ZnO to 4.101 eV for x=0.29) show a remarkable blueshift. The exciton binding energy (61 meV for ZnO) decreases to approximately 50 meV for x≈0.17 and increases to approximately 58 meV for x=0.29. In contrast to ZnO, the MgxZn1−xO alloys are found uniaxial negative below the band gap energy, opposite to previously reported results.

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