A scanning microwave microscope (SMM) for spatially resolved capacitance measurements in the attofarad-to-femtofarad regime is presented. The system is based on the combination of an atomic force microscope (AFM) and a performance network analyzer (PNA). For the determination of absolute capacitance values from PNA reflection amplitudes, a calibration sample of conductive gold pads of various sizes on a SiO(2) staircase structure was used. The thickness of the dielectric SiO(2) staircase ranged from 10 to 200 nm. The quantitative capacitance values determined from the PNA reflection amplitude were compared to control measurements using an external capacitance bridge. Depending on the area of the gold top electrode and the SiO(2) step height, the corresponding capacitance values, as measured with the SMM, ranged from 0.1 to 22 fF at a noise level of ~2 aF and a relative accuracy of 20%. The sample capacitance could be modeled to a good degree as idealized parallel plates with the SiO(2) dielectric sandwiched in between. The cantilever/sample stray capacitance was measured by lifting the tip away from the surface. By bringing the AFM tip into direct contact with the SiO(2) staircase structure, the electrical footprint of the tip was determined, resulting in an effective tip radius of ~60 nm and a tip-sample capacitance of ~20 aF at the smallest dielectric thickness.

The scanning microwave microscope is used for calibrated capacitance spectroscopy and spatially resolved dopant profiling measurements. It consists of an atomic force microscope combined with a vector network analyzer operating between 1–20 GHz. On silicon semiconductor calibration samples with doping concentrations ranging from 1015 to 1020 atoms/cm3, calibrated capacitance-voltage curves as well as derivative dC/dV curves were acquired. The change of the capacitance and the dC/dV signal is directly related to the dopant concentration allowing for quantitative dopant profiling. The method was tested on various samples with known dopant concentration and the resolution of dopant profiling determined to 20% while the absolute accuracy is within an order of magnitude. Using a modeling approach the dopant profiling calibration curves were analyzed with respect to varying tip diameter and oxide thickness allowing for improvements of the calibration accuracy. Bipolar samples were investigated and nano-scale defect structures and p-n junction interfaces imaged showing potential applications for the study of semiconductor device performance and failure analysis.

We report on an adjustable interferometric set-up for Scanning Microwave Microscopy. This interferometer is designed in order to combine simplicity, a relatively flexible choice of the frequency of interference used for measurements as well as the choice of impedances range where the interference occurs. A vectorial calibration method based on a modified 1-port error model is also proposed. Calibrated measurements of capacitors have been obtained around the test frequency of 3.5 GHz down to about 0.1 fF. Comparison with standard vector network analyzer measurements is shown to assess the performance of the proposed system.

We combine a scanning near-field microwave microscope with an atomic force microscope for use in localized thin film dielectric constant measurement, and demonstrate the capabilities of our system through simultaneous surface topography and microwave reflection measurements on a variety of thin films grown on low resistivity silicon substrates. Reflection measurements clearly discriminate the interface between approximately 38 nm silicon nitride and dioxide thin films at 1.788 GHz. Finite element simulation was used to extract the dielectric constants showing the dielectric sensitivity to be Deltaepsilon(r)=0.1 at epsilon(r)=6.2, for the case of silicon nitride. These results illustrate the capability of our instrument for quantitative dielectric constant measurement at microwave frequencies.

We report on frequency-dependent contrast in d(S11)/dV measurements of a variably doped p-type silicon sample in the frequency range from 2 GHz to 18 GHz. The measurements were conducted with a scanning microwave microscope. The measurements were done at selected frequencies while varying the DC tip voltage. The measured d(S11)/dV signal shows a maximum for doping concentrations (NA) of 1015 cm−3−1016 cm−3 at 2.3 GHz. As the microscope operating frequency is increased, this maximum sequentially “switches” through the regions of increasing dopant concentration, displaying a maximum for NA of 1017 cm−3−1018 cm−3 at 17.9 GHz. The frequency dependent “switching” is attributed to the physics of tip-to-sample interaction, particularly as related to the frequency-dependent local surface resistance and the depletion capacitance that control the RC time constant of tip-to-sample interaction. This provides a unique platform for local, frequency-selective, spatially resolved microwave spectroscopy of semiconducting materials.