New precursors, 2,2,6,6-tetramethyl-3,5-octanedionato (TMOD) yttrium and neodymium complexes were synthesized for metalorganic chemical vapor deposition (MOCVD). The melting points of the TMOD complexes were much lower than those of the conventional dipivaloylmethanato (DPM) complexes. These complexes can be used in the liquid state where a stable deposition rate can be obtained. It was confirmed that the oxide thin films, Y2O3 and Nd2O3, could be fabricated by an MOCVD method using these complexes.
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