No abstract

A compact nanoimprint lithography ͑NIL͒ system using the driving power of a stepping motor has been developed. Compared to a conventional NIL system with a hydraulic press, there are some additional features of the NIL system such as compactness and low cost. We propose the use of spin on glass ͑SOG͒ instead of PMMA to avoid thermal expansion and demonstrate SOG patterns with 200 nm linewidths at room temperature replications using the NIL system. The SOG patterns were transferred to gold metal using liftoff and to a silicon substrate by reactive ion etching.

Articles you may be interested inFabrication of an adhesion-free transparent roll stamp for large area patterning using ultraviolet-type roller nanoimprint lithography Room-temperature nanoimprint lithography ͑RT-NIL͒ technology has been developed to overcome critical dimensions and pattern placement errors caused by thermal expansion in the conventional nanoimprint lithography ͑NIL͒ process. We propose RT-NIL using hydrogen silsequioxane ͑HSQ͒ instead of the poly͑methylmethacrylate͒ used in conventional NIL. We demonstrate HSQ-replicated patterns with a 90 nm diameter hole and 50 nm linewidth for room-temperature replications. Furthermore, we have developed new nanotransfer printing technology utilizing the adhesion characteristics of HSQ. We also demonstrate the transfer of photoresist and Au patterns from a mold to a substrate.

No abstract

No abstract