Graphene serves critical application and research purposes in various fields. However, fabricating highquality and large quantities of graphene is time-consuming and it requires heavy human resource labor costs. In this paper, we propose a Machine Learning-based Automatic Graphene Detection Method with Color Correction (MLA-GDCC), a reliable and autonomous graphene detection from microscopic images. The MLA-GDCC includes a white balance (WB) to correct the color imbalance on the images, a modified U-Net and a support vector machine (SVM) to segment the graphene flakes. Considering the color shifts of the images caused by different cameras, we apply WB correction to correct the imbalance of the color pixels. A modified U-Net model, a convolutional neural network (CNN) architecture for fast and precise image segmentation, is introduced to segment the graphene flakes from the background. In order to improve the pixel-level accuracy, we implement a SVM after the modified U-Net model to separate the monolayer and bilayer graphene flakes. The MLA-GDCC achieves flake-level detection rates of 87.09% for monolayer and 90.41% for bilayer graphene, and the pixel-level accuracy of 99.27% for monolayer and 98.92% for bilayer graphene. MLA-GDCC not only achieves high detection rates of the graphene flakes but also speeds up the latency for the graphene detection process from hours to seconds.

Defects to popular two-dimensional (2D) transition metal dichalcogenides (TMDs) seriously lower the efficiency of field-effect transistor (FET) and depress the development of 2D materials. These atomic defects are mainly identified and researched by scanning tunneling microscope (STM) because it can provide precise measurement without harming the samples. The long analysis time of STM for locating defects in images has been solved by combining feature detection with convolutional neural networks (CNN). However, the low signal-noise ratio, insufficient data, and a large amount of TMDs members make the automatic defect detection system hard to be applied. In this study, we propose a deep learning-based atomic defect detection framework (DL-ADD) to efficiently detect atomic defects in molybdenum disulfide (MoS2) and generalize the model for defect detection in other TMD materials. We design DL-ADD with data augmentation, color preprocessing, noise filtering, and a detection model to improve detection quality. The DL-ADD provides precise detection in MoS2 (F2-scores is 0.86 on average) and good generality to WS2 (F2-scores is 0.89 on average).

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