The study of thermoelectric properties of crystalline semiconductors with structural defects is of practical interest in the development of radiation-resistant Peltier elements. In this case, the spectrum of energy levels of hydrogen-like impurities and intrinsic point defects in the band gap (energy gap) of crystal plays an important role.The purpose of this work is to analyze the features of the single-electron band model of semiconductors with hopping electron migration both via atoms of hydrogen-like impurities and via their own point triplecharged intrinsic defects in the c- and v-bands, as well as to search for the possibility of their use in the Peltier element in the temperature range, when the transitions of electrons and holes from impurity atoms and/or intrinsic defects to the c- and v-bands can be neglected.For Peltier elements with electron hopping migration we propose: (i) an h-diode containing |d1)and |d2)-regions with hydrogen-like donors of two types in the charge states (0) and (+1) and compensating them hydrogen-like acceptors in the charge state (−1); (ii) a homogeneous semiconductor containing intrinsic t-defects in the charge states (−1, 0, +1), as well as ions of donors and acceptors to control the distribution of t-defects over the charge states. The band diagrams of the proposed Peltier elements in equilibrium and upon excitation of a stationary hopping electric current are analyzed.A model of the h-diode containing hydrogen-like donors of two types |d1) and |d2) with hopping migration of electrons between them for 50 % compensation by acceptors is considered. It is shown that in the case of the reverse (forward) electrical bias of the diode, the cooling (heating) of the region of the electric double layer between |d1)and |d2)-regions is possible.A Peltier element based on a semiconductor with point t-defects is considered. It is assumed that the temperature and the concentration of ions of hydrogen-like acceptors and donors are to assure all t-defects to be in the charge state (0). It is shown that in such an element it is possible to cool down the metal-semiconductor contact under a negative electric potential and to heat up the opposite contact under a positive potential.

A quasi-classical model for calculating DC (direct current) electrical conductivity in crystalline semiconductors with hydrogen-like impurities is developed at the transition from band conduction to impurity hopping conduction with decreasing temperature. This transition from the minimum band conductivity to the maximum hopping conductivity via impurities has the form of a characteristic "kink" in the temperature dependence of the electrical resistivity. The idea of the calculation is to preliminarily determine the transition temperature Tj using the standard approach within the framework of the two-band model. The shift of the top of the v-band (the bottom of the c-band) into the depth of the band gap due to the formation of a quasi-continuous band of allowed energy values from the excited states of acceptors (donors) is taken into account. This leads to a decrease in the value of a thermal ionization energy of the majority shallow impurities due to a decrease in the maximum localization radius of a hole on an acceptor (an electron on a donor) with increasing impurity concentration. The values of the observed maximum hopping conductivity and drift hopping mobility corresponding to the temperature Tj are calculated. The numerical calculation within the framework of the proposed model is consistent with the known experimental data on the electrical conductivity and Hall coefficient of moderately compensated p-Ge crystals doped by neutron transmutation and non-intentionally compensated metallurgically doped n-Ge, as well as n- and p-Si crystals on the insulator side of the Mott insulator--metal concentration phase transition. Keywords: bulk crystals of germanium and silicon, hydrogen-like acceptors and donors, holes and electrons, band and hopping motion of charge carriers.

m are responsible for stationary electrical conductivity at arbitrarily low temperatures even in the absence of illumination (see Figure 2). Further, Mott (see ref.[1] and references therein),

The study of the electrophysical characteristics of crystalline semiconductors with structural defects is of practical interest in the development of radiation-resistant varactors. The capacitance-voltage characteristics of a disordered semiconductor can be used to determine the concentration of point defects in its crystal matrix. The purpose of this work is to calculate the low-frequency admittance of a capacitor with the working substance “insulator–crystalline semiconductor with point t-defects in charge states (−1), (0) and (+1)–insulator”. A layer of a partially disordered semiconductor with a thickness of 150 μm is separated from the metal plates of the capacitor by insulating layers of polyimide with a thickness of 3 μm. The partially disordered semiconductor of the working substance of the capacitor can be, for example, a highly defective crystalline silicon containing point t-defects randomly (Poissonian) distributed over the crystal in charge states (−1), (0), and (+1), between which single electrons migrate in a hopping manner. It is assumed that the electron hops occur only from t-defects in the charge state (−1) to t-defects in the charge state (0) and from t-defects in the charge state (0) to t-defects in the charge state (+1).In this work, for the first time, the averaging of the hopping diffusion coefficients over all probable electron hopping lengths via t-defects in the charge states (−1), (0) and (0), (+1) in the covalent crystal matrix was carried out. For such an element, the low-frequency admittance and phase shift angle between current and voltage as the functions on the voltage applied to the capacitor electrodes were calculated at the t-defect concentration of 3∙1019 cm−3 for temperatures of 250, 300, and 350 K and at temperature of 300 K for the t-defect concentrations of 1∙1019, 3∙1019, and 1∙1020 cm−3.

The study of the parameters of capacitors with various working substances is of interest for the design and creation of electronic elements, in particular for the development of high-frequency phase-shifting circuits.The purpose of the work is to calculate the high-frequency capacitance of a capacitor with the working substance "insulator-undoped silicon-insulator" at different applied to the capacitor direct current (DC) voltages, measuring signal frequencies and temperatures.A model of such the capacitor is proposed, in which 30 µm thick layer of undoped (intrinsic) crystalline silicon (i-Si) is separated from each of the capacitor electrodes by 1 µm thick insulator layer (silicon dioxide).The dependences of the capacitor capacitance on the DC electrical voltage U on metal electrodes at zero frequency and at the measuring signal frequency of 1 MHz at absolute temperatures T = 300 and 400 K are calculated. It is shown that the real part of the capacitor capacitance increases monotonically, while the imaginary part is negative and non-monotonically depends on U at the temperature T = 300 K. An increase in the real part of the capacitor capacitance up to the geometric capacitance of oxide layers with increasing temperature is due to a decrease in the electrical resistance of i-Si layer. As a result, with an increase in temperature up to 400 K, the real and imaginary parts of the capacitance take constant values independent of U. The capacitance of i-Si layer with an increase in both temperature T and voltage U is shunted by the electrical conductivity of this layer. The phase shift is determined for a sinusoidal electrical signal with a frequency of 0.3, 1, 10, 30, 100, and 300 MHz applied to the capacitor at temperatures 300 and 400 K.