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Track‐etched membranes were used as support for deposition of plasma polymerized layers and formation of bipolar nanofiltration membranes. The 75 KHz plasma reactor was applied for that purpose. Three kinds of monomers were plasma polymerized. They were as follows: n‐butylamine, allylamine, and acrylic acid. For each monomer, the best polymerization parameters were selected. It was determined that acrylic acid deposited at the highest rate, then deposited allyloamine and finally n‐butylamine. Among the electrodes, the grounded one offered more stable layer and can be used for plasma polymer deposition. The obtained membranes showed good rejection properties toward bivalent ions. It was shown that the sequence of deposited layers did not affect the separation properties. For some investigated membranes, rejection reached 50–80% value. © 2013 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 2014, 131, 39790.

Preparation and properties of molecularly imprinted membranes for the removal of bisphenol A have been presented. Molecularly imprinted membranes were prepared by phase inversion from polysulfone and sulfonated polysulfone. The effect of footprints affinity was observed for membranes obtained from sulfonated derivatives. It was noted that bisphenol A was well-retained by the membrane with an ion exchange capacity of 0.58 mmol/g. High water permeability is the additional profit for the use of membranes prepared from sulfonated polysulfone.

The use of colloid-enhanced ultrafiltration for boron removal from water is investigated. Biodegradable surfactant, 1,4-sorbitol oleate, was applied to obtain micelles and high molecular weight chitosan to reinforce their stability. Two kind of membranes were compared: neat porous polysulfone membrane and charged porous sulfonated polysylfone membrane; both with similar average pore diameter of 5 nm. The studies revealed that two key factors affect the boron rejection: presence of surfactant in the colloidal mixture and a repulsion effect of sulfone groups on the membrane surface. Both have a positive effect on boron removal.