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A.; Madan, H. S.; Kirk, A. P.; et al., "Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3," Appl. Phys. Lett. 97, 143502 (2010); http:// dx

Quantum wells of InGaSb clad by AlGaSb were grown by molecular beam epitaxy. The InGaSb is in compressive strain, resulting in a splitting of the heavy- and light-hole valence bands and an enhancement of the mobility. The mobility was found to increase with increasing InSb mole fraction for values of strain up to 2%. Room-temperature mobilities as high as 1500cm2∕Vs were reached for 7.5nm channels of In0.40Ga0.60Sb. These results are an important step toward the goal of high-performance p-channel field-effect transistors for complementary circuits operating at extremely low power.

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