The PHENIX detector is designed to perform a broad study of A-A, p-A, and p-p collisions to investigate nuclear matter under extreme conditions. A wide variety of probes, sensitive to all timescales, are used to study systematic variations with species and energy as well as to measure the spin structure of the nucleon. Designing for the needs of the heavy-ion and polarized-proton programs has produced a detector with unparalleled capabilities. PHENIX measures electron and muon pairs, photons, and hadrons with excellent energy and momentum resolution. The detector consists of a large number of subsystems that are discussed in other papers in this volume. The overall design parameters of the detector are presented. The PHENIX detector is designed to perform a broad study of A-A, p-A, and p-p collisions to investigate nuclear matter under extreme conditions. A wide variety of probes, sensitive to all timescales, are used to study systematic variations with species and energy as well as to measure the spin structure of the nucleon. Designing for the needs of the heavy-ion and polarized-proton programs has produced a detector with unparalleled capabilities. PHENIX measures electron and muon pairs, photons, and hadrons with excellent energy and momentum resolution. The detector consists of a large number of subsystems that are discussed in other papers in this volume. The overall design parameters of the detector are presented. Disciplines Engineering Physics | Physics Comments This is a manuscript of an article from Nuclear Instruments and Methods in Physics Research

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A l m s , Nh4 87545 Absfracb-The PHENIX Photon Electron New Heavy Ion Experiment] Detector is one of two large detectors presently d e r construction for RHIC (Relativistic Heavy Ion CoIIider) bated at B m b v e n NationaI Laboratory. Its primary god is to detect a new p k of matter; the quark-gluon plasma. In d e r to achieve this objective, the PHENIX Detector utlllzea a compk. magnet snbsystem which is comprised of two Iarge magnets fdenti5ed as the CentraI Magnet (CM) and the Muon Magnet 0. Muon IdentiRer steel is also included as part of this package. The entire magnet subsystem stands over 10 metvr tail and weighs in excess of 1900 tons (see Fig. 1). Magnet size alone provided many technical challenges thromgbont the design and fabrication of the project. In .ddition, interaction with foreign coUaborators provided the autborJ with new areas to address and problems to solve. (Banpaku) Tanaka of KEK, National Laboratory of High Energy Physics in Japan and Kazuo Katoh and Tatsuya Kuroda of the TOKIN Corporation, Japan for providing the Central Magnet Outer Coils in excellent working order. Last but not least, we would like to thank our secretary at UNL, Sonia Ham, for providing support to this project throughout its many stages, including the myriad of foreign travel requests required during the fabrication phase of the project. ~

EUVL mask blanks consist of a distributed Bragg reflector made of 6.7nm-pitch bi-layers of MO and Si deposited upon a precision Si or glass substrate. The layer deposition process has been optimized for low defects, by application of a vendor-supplied but highly modified ion-beam sputter deposition system. This system is fully automated using SMIF technology to obtain the lowest possible environmental-and handling-added defect levels. Originally designed to coat 150mm substrates, it was upgraded in July, 1999 to 200 mm and has coated runs of over 50 substrates at a time with median added defects >lOOnm below O.O5/cm*. These improvements have resulted from a number of ion-beam sputter deposition system modifications, upgrades, and operational changes, which will be discussed.Success in defect reduction is highly dependent upon defect detection, characterization, and cross-platform positional registration. We have made significant progress in adapting and extending commercial tools to this purpose, and have identified the surface scanner detection limits for different defect classes, and the signatures of false counts and non-printable scattering anomalies on the mask blank. We will present key results and how they have helped reduce added defects.The physics of defect reduction and mitigation is being investigated by a program on multilayer growth over deliberately placed perturbations (defects) of varying size. This program includes modeling of multilayer growth and modeling of defect printability. We developed a technique for depositing uniformly sized gold spheres on EUVL substrates, and have studied the suppression of the perturbations during multilayer growth under varying conditions. This work is key to determining the lower limit of critical defect size for EUV Lithography. We present key aspects of this work.We will summarize progress in all aspects of EUVL mask blank development, and present detailed results on defect reduction and mask blank performance at EUV wavelengths.

August 19, 1998This is a preprint of a paper intended for publication in a journal or proceedings. Since changes may be made before publication, this preprint is made available with the understanding that it will not be cited or reproduced without the permission of the author. PREPRINTThis paper was prepared for submittal to the DISCLAIMER This document was prepared as an account of work sponsored by an agency of the United States Government. Neither the United States Government nor the University of California nor any of their employees, makes any warranty, express or implied, or assumes any legal liability or responsibility for the accuracy, completeness, or usefulness of any information, apparatus, product, or process disclosed, or represents that its use would not infringe privately owned rights. Reference herein to any specific commercial product, process, or service by trade name, trademark, manufacturer, or otherwise, does not necessarily constitute or imply its endorsement, recommendation, or favoring by the United States Government or the University of California. The views and opinions of authors expressed herein do not necessarily state or reflect those of the United States Government or the University of California, and shall not be used for advertising or product endorsement purposes. UCRL-JC-131522 ENGINEERING THE NATIONAL IGNITION FACILITY ABSTRACTThe engineering team of the National Ignition Facility (NIF) has developed a highly optimized hardware design that satisfies stringent cost, performance and schedule requirements. After a 3-year effort, the design will culminate at the end of FY98 with the completion of major Title II design reviews. Every element of the facility from optic configuration, facility layout and hardware specifications to material selection, fabrication techniques and part tolerancing has been examined to assure the minimum cost per joule of laser energy delivered on target. In this paper, the design of the major subsystems will be discussed from the perspective of this optimization emphasis. Focus will be placed on the special equipment hardware which includes laser, beam transport, opto-mechanical , system control and target area systems. Some of the unique features in each of these areas will be discussed to highlight how significant cost savings have been achieved while maintaining reasonable and acceptable performance risk. Key to the success has also been a vigorous development program that commenced nearly 4 years ago and has been highly responsive to the specific needs of the NIF project. Supporting analyses and prototyping work that evolved from these parallel activities will also be discussed.