Nano-sized multi-layers copper-doped SrZrO3, platinum (Pt) and silicon oxide (SiO2) on silicon substrates were prepared by dense plasma focus (DPF) device with the high purity copper anode tip and analyzed by using small angle neutron scattering (SANS) to establish a reliable method for the non-destructive evaluation of the under-layer structure. Thin film was well formed at the time-to-dip of 5 microsec with stable plasma of DPF. Several smooth intensity peaks were periodically observed when neutron beam penetrates the thin film with multi-layers perpendicularly. The platinum layer is dominant to intensity peaks, where the copper-doped SrZnO3 layer next to the platinum layer causes peak broadening. The silicon oxide layer has less effect on the SANS spectra due to its relative thick thickness. The SANS spectra shows thicknesses of platinum and copper-doped SrZnO3 layers as 53 and 25 nm, respectively, which are well agreement with microstructure observation.

Silicon dioxide film derived from polyphenylcarbosilane (PPCS) is being investigated for electronic ceramics and applications to dielectric materials. Polyphenylcarbosilane was heat treated under oxygen atmosphere to fabricate SiO 2 film. The mechanical property and dielectric constant of the film were measured using a nanoindenter and a semiconductor parameter analyser with metal-insulator-semiconductor structure. The chemical behaviour and structure were analysed with an X-ray photoelectron spectrometer and a differential thermal analyser. From the results, the silicon oxide film was synthesised from PPCS due to proper heat treatment. Elastic modulus values of the fired PPCS film were from 8?9 to 27?9 GPa and hardness values of the fired PPCS film were from 0?47 to 2?29 GPa with increasing firing temperature. Change in mechanical properties is related to intermolecular binding strength in the film.