β-W is a metastable, topologically close-packed phase with the A15 structure. The deposition of β-W, using N 2 as the impurity gas introduced into the sputtering chamber, is reported and a mechanism for its formation is proposed. Molecules of the impurity gas in the chamber are adsorbed onto the surface during the deposition process and act as nucleation sites for the formation of β-W. The proposed mechanism is supported by the dependence of β-W phase fraction in sputter deposited films on pressure of N 2 and on substrate temperature.
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