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Poly(methyl methacrylate/2-methacryloylethyl methacrylate)-based copolymers of varying composition have been synthesized and characterized. Free-radical polymerization of hydroxyethyl methacrylate and methyl methacrylate over a range of monomer feed ratios gives an ideal random copolymer series which has been functionalized by further methacryloylation of the pendant hydroxyl group. The resulting polymers have been cross-linked both thermally and by UV exposure, as evidenced by infrared and solid-state NMR spectroscopy. After thermal cross-linking the polymers remain stable up to 200 °C. Variation of polymer composition has allowed the refractive index to be tuned between 1.497 and 1.518, a range suitable for waveguide applications, and channel waveguides have been fabricated by UV writing. The propagation loss of these channel waveguides is less than 1 dB/cm at a range of near-IR wavelengths.

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We have synthesized a series of thermally cross-linkable photoacid generators. Among them, we used bis(4-(2-(vinyloxy)ethoxy)benzene)-4-methoxybenzene sulfonium triflate and tris(4-(2-(vinyloxy)ethoxy)benzene) sulfonium triflate for two or three component photopolymers, containing a phenolic binder polymer and a cross-linkable photoacid generator. On irradiation with deep UV, the photopolymer films had sensitivities of ca. 10 ti 20 mJ/cm2. The films, especially composed of polyp-hydroxystyrene-co-styrene), 2, 2-bis(4-(2-(vinyloxy)ethoxy)phenyl)propane, and a cross-linkable photoacid generator, showed the high resolution of 0.24 I.L m L/S under KrF excimer laser stepper (NA 0.45).

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