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We report the electrical properties of a full-bit functional 8Mb 1T-1C Embedded Ferroelectric Random Access Memory (eFRAM) fabricated within a low-leakage 130nm 5LM Cu interconnect CMOS logic process. To increase manufacturability and reliability margins, we have introduced a single-bit substitution methodology that replaces bits at the low-end of the original distribution with redundant elements leading to an increased signal margin. Further, we have fabricated a Digital Signal Processor (DSP) using the eFRAM process flow and have shown that the operating frequency is nearly the same relative to the CMOS baseline. With the development of logic-compatible eFRAM, we have created a technology platform that enables ultra-low-power devices.
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