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Multilayer dielectric (MLD) diffraction gratings are a key component for the construction of high-peak-power, pulsecompressed laser systems. While a great deal of effort has been devoted to the design of optimal grating structures and the etching of these structures into the MLD coating, there has not been the same effort put into the optimization of the MLD coating itself. The primary characteristics of the multilayer that must be considered during design include minimization of the standing wave created in the photoresist because of the reflectivity of the coated optical surface, creation of a sufficiently high reflectivity at the use wavelength and incidence angle in a dry environment, proper balance of the individual layer materials to yield a coating with an overall neutral or slightly compressive stress, and a high laserdamage threshold for the wavelength and pulse duration of use. This work focuses on the modification of a standard MLD mirror, while considering these characteristics, to allow the fabrication of a diffraction grating with higher efficiency and laser-damage threshold than is typically achieved. Scanning electron microscopy (SEM) images of the grating structures demonstrate smoother shapes with lower roughness due to the holographic exposure. Damage testing performed at 1053 nm with a pulse width of 10 ps demonstrates the MLD coating has a sufficiently high laser-damage threshold to form the basis of reflection gratings that survive in high-fluence applications.

Thin-film polarizers are essential components of large laser systems such as OMEGA EP and the NIF because of the need to switch the beam out of the primary laser cavity (in conjunction with a plasma-electrode Pockels cell) as well as providing a well-defined linear polarization for frequency conversion and protecting the system from back-reflected light. The design and fabrication of polarizers for pulse-compressed laser systems is especially challenging because of the spectral bandwidth necessary for chirped-pulse amplification.The design requirements for a polarizer on the OMEGA EP Laser System include a T p greater than 98% over a spectral range of 1053±4 nm while maintaining a contrast ratio ( ) p s T T of greater than 200:1 (500:1 goal) over the same range. An allowance must be made for the uniformity of the film deposition such that the specifications are met over the aperture of the component while allowing for some tolerance of angular misalignment. Production results for hafnia/silica designs will be shown, illustrating high transmission and contrast over an extended wavelength/angular range suitable for the 8-nm spectral bandwidth of OMEGA EP. Difficulties in production will also be illustrated, as well as the methods being implemented to overcome these challenges. A key challenge continues to be the fabrication of such a coating suitable for use on fusedsilica substrates in a dry environment. Laser-damage thresholds for 1-ns and 10-ps pulse widths will be discussed.

A dispersive mirror and a coating uniformity challenge were the topics of the design contest held in conjunction with the 2016 Optical Interference Coatings topical meeting of The Optical Society (OSA). A total of 18 designers from China, France, Germany, Japan, and the United States submitted 38 total designs for problems A and B. Michael Trubetskov submitted the winning designs for all four design challenges. The design problems and the submitted solutions are described and evaluated.