The combination of electrochemistry and spectroscopy, known as spectroelectrochemistry (SEC), is an already established approach. By combining these two techniques, the relevance of the data obtained is greater than what it would be when using them independently. A number of review papers have been published on this subject, mostly written for experts in the field and focused on recent advances. In this review, written for both the novice in the field and the more experienced reader, the focus is not on the past but on the future. The scope is narrowed down to four techniques the authors claim to have the most potential for the future, namely: infrared spectroelectrochemistry (IR-SEC), Raman spectroelectrochemistry (Raman-SEC), nuclear magnetic resonance spectroelectrochemistry (NMR-SEC) and, perhaps slightly more controversial but certainly promising, electrochemistry mass-spectrometry (EC-MS).

A robust method is developed for large-scale fabrication of high-quality tunable gold nanogap arrays at low-cost for surface-enhanced Raman scattering.

We present a modular microfluidic chip, containing a microreactor and mixing channels, hyphenated with ATR-FTIR for real-time online analysis.

This work reports the fabrication of large-area Au nanoantennas, tuned to 1400cm-1 , on a Si substrate for surfaceenhanced-infrared-absorption-spectroscopy. Two different kinds of nanoantennas are fabricated, namely nano-rods and nano-slits. Fabrication is achieved by E-beam lithography (EBL). The need for an adhesion layer is eliminated using our previously reported UV-ozone pre-treatment 1. To our knowledge, this is the first time this technique is used to fabricate Au nanoantennas on Si without the need adhesion layer, while at the same time obtaining a strong adhesion. This UVozone treatment does not only speed up the fabrication process, it can potentially increase the enhancement quality due to the negative influence metallic adhesion layers can have on the plasmon resonance of Au nanoantennas 2-4. Next to using the standard positive resist for EBL lithography, we also propose a workflow using a negative photoresist to make the nano-rod antennas, potentially speeding up the process by skipping the lift off procedure. Although the negative photoresist fabrication process still requires optimization, our first fabrication attempt show promising results. In order to get the optimal enhancement for a given wavelength, we used FTDT simulations to simulate the structure length, height, width and pitch. After successful simulations, the structures were fabricated and a comparison between the simulated results and fabricated structures was made, confirming the simulation results.