No abstract

No abstract

No abstract

Mn-doped Si x Ge 1−x nanowires (NWs) with different Ge concentrations have been studied by first-principles calculations. It is found that the spin dependent energy bands of the NWs show rich variations both in bandgap width and type (from indirect to direct) as the Ge concentration changes. The Mn-doped Si x Ge 1−x NWs exhibit half-metallic characteristics for all Ge concentrations, and the ground states of the NWs are found to be ferromagnetic (FM). The net magnetization mapping and spin density of states calculations reveal that Mn 3d electrons have a strong hybridization effect with nearest Ge 4p electrons, which results in the Ge's nontrivial contribution to the magnetic moment of the NWs. Further magnon dispersion studies show that the magnetic order stability of the NWs is influenced by Ge concentrations. Finally, the dependence of the optical properties of the magnetic NWs on the Ge concentration is demonstrated. Our results suggest that Mn-doped Si x Ge 1−x NWs may be useful in spintronic and optoelectronic devices.

The separation distance between the electron channel at oxide∕Si interface and the strained-Si∕relaxed-SiGe heterojunction can significantly affect the effective electron mobility of metal–oxide–silicon field-effect transistors due to the roughness scattering of the underneath Si∕SiGe heterojunction. The mobility degradation due to the Si∕SiGe heterojunction with the roughness of 7 nm becomes insignificant when the strained-Si thickness is larger than ∼20nm. A clear hole confinement shoulder is observed in the accumulation region of the capacitance–voltage curves, indicating that the abrupt transition from the SiGe buffer to strained Si is maintained at the rough heterojunction. The heterojunction roughness scattering not only degrades the electron mobility, but also degrades the device characteristics such as the transconductance and cut-off frequency.