High-quality coatings of fluoride materials are in extraordinary demand for use in deep ultraviolet (DUV) lithography. Gadolinium fluoride (GdF₃) thin films were prepared by a thermal boat evaporation process at different substrate temperatures. GdF₃ thin film was set at quarter-wave thickness (∼27  nm) with regard to their common use in DUV/vacuum ultraviolet optical stacks; these thin films may significantly differ in nanostructural properties at corresponding depositing temperatures, which would crucially influence the performance of the multilayers. The measurement and analysis of optical, structural, and mechanical properties of GdF₃ thin films have been performed in a comprehensive characterization cycle. It was found that depositing GdF₃ thin films at relative higher temperature would form a rather dense, smooth, homogeneous structure within this film thickness scale.

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Most of the optical axes in modern systems are bent for optomechanical considerations. Antireflection (AR) coatings for polarized light at oblique incidence are widely used in optical surfaces like prisms or multiform lenses to suppress undesirable reflections. The optimal design and fabrication method for AR coatings with large-angle range (68°-74°) for a P-polarized 193 nm laser beam is discussed in detail. Experimental results showed that after coating, the reflection loss of a P-polarized laser beam at large angles of incidence on the optical surfaces is reduced dramatically, which could greatly improve the output efficiency of the optical components in the deep ultraviolet vacuum range.