Topological insulators (TIs) are renowned for their exotic topological surface states (TSSs) that reside in the top atomic layers, and hence, detailed knowledge of the surface top atomic layers is of utmost importance. Here we present the remarkable morphology changes of Bi2Te3 surfaces, which have been freshly cleaved in air, upon subsequent systematic annealing in ultrahigh vacuum and the resulting effects on the local and area-averaging electronic properties of the surface states, which are investigated by combining scanning tunneling microscopy (STM), scanning tunneling spectroscopy (STS), and Auger electron spectroscopy (AES) experiments with density functional theory (DFT) calculations. Our findings demonstrate that the annealing induces the formation of a Bi bilayer atop the Bi2Te3 surface. The adlayer results in n-type doping, and the atomic defects act as scattering centers of the TSS electrons. We also investigated the annealing-induced Bi bilayer surface on Bi2Te3 via voltage-dependent quasi-particle-interference (QPI) mapping of the surface local density of states and via comparison with the calculated constant-energy contours and QPI patterns. We observed closed hexagonal patterns in the Fourier transform of real-space QPI maps with secondary outer spikes. DFT calculations attribute these complex QPI patterns to the appearance of a "second" cone due to the surface charge transfer between the Bi bilayer and the Bi2Te3. Annealing in ultrahigh vacuum offers a facile route for tuning of the topological properties and may yield similar results for other topological materials.
In this paper, the authors demonstrate that Auger electron spectroscopy (AES) is an effective characterization tool in the analysis of the cleaning of semiconductor surfaces under different atmospheres. AES has several advantages for this purpose: it is nondestructive, surface specific {the analysis depth is only 4-50 Å [Childs et al., Handbook of Auger Electron Spectroscopy (Physical Electronics, Eden Prairie, MN, 1995)]}, and very sensitive to common contaminants such as carbon and oxygen. Furthermore, the authors have proven that AES allows us to describe the effectiveness of surface cleaning in a quantitative manner by comparing the peak-to-peak height of the oxygen signal for different samples. In this work, the surface cleaning of five semiconductors, namely, Si, Ge, GaAs, In 0.5 Ga 0.5 As, and In 0.5 Al 0.5 As, was investigated. The same standard HF cleaning procedure was applied in two different atmospheres, air or nitrogen. The latter was used to prevent reoxidation after cleaning. The authors found that for most of these semiconductors, the atmosphere in which the cleaning is performed has a significant influence on the results, reducing the oxygen peak-to-peak height with an extra 11.18% (average of all the semiconductors investigated) when comparing cleaning in N 2 to cleaning in air. Complementary characterization of the effectiveness of the cleaning procedure was accomplished by in situ AES, atomic force microscopy, and reflection high-energy electron diffraction for GaAs samples. V
We investigated the topological insulator (TI) BiTe in four different environments (ambient, ultra-high vacuum (UHV), nitrogen gas and organic solvent environment) using scanning probe microscopy (SPM) techniques. Upon prolonged exposure to ambient conditions and organic solvent environments the cleaved surface of the pristine BiTe is observed to be strongly modified during SPM measurements, while imaging of freshly cleaved BiTe in UHV and nitrogen gas shows considerably less changes of the BiTe surface. We conclude that the reduced surface stability upon exposure to ambient conditions is triggered by adsorption of molecular species from ambient, including HO, CO, etc which is verified by Auger electron spectroscopy. Our findings of the drastic impact of exposure to ambient on the BiTe surface are crucial for further in-depth studies of the intrinsic properties of the TI BiTe and for potential applications that include room temperature TI based devices operated under ambient conditions.
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