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Stretchable Cu electrodes are fabricated by direct deposition on He- and O2-plasma-treated and prestretched poly(dimethylsiloxane) (PDMS) substrates. The electrodes show conductivity owing to the formation of a hard and thin silica-like blocking layer, which forms low-period wavy structures on the PDMS substrate surface. The stretchable Cu electrode fabricated with He-plasma treatment shows superior performance compared with that fabricated with O2-plasma treatment under a strain condition owing to the lack of –OH groups on the surface. In situ microscopy images obtained under strain conditions indicate that the good stretching capability of the stretchable Cu electrode originates from its low-frequency (long-period) wavy structure. X-ray photoelectron spectroscopy measurements are performed to study the various impurities in the stretchable Cu electrode.

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초록: 본 연구에서는 산소 플라즈마 처리된 poly(dimethylsiloxane)(PDMS) 기판 위에 은 전극을 사용하여 신축성 있 는 전극을 제작하였다. 신축성있는 기판 상에 은 전극을 직접 증착함으로써 복잡한 전사과정을 피할 수 있다. 간단 한 산소 플라즈마 처리를 통해 신축성 기판표면에 탄소 불순물을 줄이고 은 전극과 신축성 기판 사이의 접착력을 강 화할 수 있어서, temporal 및 prolonged mechanical strain 측정 시, 전극의 신축 능력과 안정성을 향상시킬 수 있었다.Abstract: In this study, stretchable electrodes are demonstrated with silver electrodes on an oxygen-plasma-treated poly(dimethylsiloxane) (PDMS) substrate. The direct deposition of a silver electrode on a compliant substrate was used to avoid a complicated transfer process. We found that the stretching capability and stability under temporal and prolonged mechanical strain are improved by a simple oxygen plasma treatment on the compliant substrate due to the modified surface with reduced carbon impurities and enhanced adhesion properties between the Ag and the compliant substrate. The results show that the oxygen plasma treatment is useful for forming highly stable metal electrodes on a compliant substrate because it minimizes the number of processing steps needed.

Morphology of periodical nanoscale pores in AAO templates has been studied in relation with anodizing process, focusing on the growth of nickel nanowires by electrochemical deposition. The AAO templates were prepared by a two-step anodization process. The high purity aluminum plates were anodized in oxalic acid aqueous solution with variation of cell voltage. The pore size and interpore distance both increase with the applied potential. During the post treatment of barrier thinning, small-size pores with splitup structure at the tips are observed due to current-limited anodizing process (decreasing cell potential). The rectifying properties of the barrier layer allow the pores to be filled by nickel by AC electrodeposition. The nickel nanowires array shows the ferromagnetic properties with a preferred magnetic orientation along the wire axis.