A negative tone deep ultraviolet resist, a mixture of phosphotungstic acid and poly(vinyl alcohol) is described. This resist has <100 mJ cm -2 sensitivity and resolves -<0.3 ~m features. Even though the photochemistry involves chemical amplification, the exposed patterns are stable and the process tolerates hours between the exposure and the post-bake steps. The resist is spun from an aqueous solution, and its wet processing is also aqueous. This resist is used in a bilayer scheme, where advantage is taken of both the resistance of the tungsten oxide to oxygen plasmas and its easy stripping in fluorine-containing plasmas. Because poly(vinyl alcohol) is intrinsically a wetting agent, pinhole-free resist films of -1000 A thickness can be spun. These thin coatings provide sufficient oxygen plasma etch resistance to allow patterning of a thick 1.5 ~m novolac planarizing layer underneath the resist.) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 169.230.243.252 Downloaded on 2014-12-12 to IP ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 169.230.243.252 Downloaded on 2014-12-12 to IP

Time-resolved Raman spectroscopy is evaluated as a tool for studying reactions in aerosol microdroplets. As a test reaction, the absorption of D(2)O vapor by an optically levitated glycerol droplet is considered. With the present apparatus, time scales of the order of 1 s have been resolved. By considering the relative amplitude of various features, the composition of the suspended droplet can be estimated as a function of time. In addition, for the D(2)O-glycerol system the average temperature of the optically levitated droplet can be deduced.

No abstract

pretation (easier extraction of thickness and conduction properties).

No abstract