Random telegraph noise (RTN) has been studied in amorphous TiOx (α-TiOx) resistance switching random access memories (RRAMs). The RTN having two discrete current levels was observed only in the high-resistance state of the RRAMs. By investigating the bias dependence of capture and emission time constants, we extracted the vertical location of a trap responsible for the RTN in RRAM devices. The trap causing the RTN was found around 5.7 nm below the Ti (top electrode). The trap energy was less by 0.18 eV than the conduction band edge of the TiOx.

As dimensions of resistive random access memories (RRAMs) devices continue to shrink, the low-frequency noise of nanoscale devices has become increasingly important in evaluating the device reliability. Thus, we investigated random telegraph noise (RTN) caused by capture and emission of an electron at traps. We physically analyzed capture and emission processes through systematic measurements of amorphous TiOx (alpha-TiOx)-based bipolar RRAMs. RTNs were observed during high-resistance state (HRS) in most devices. However, discrete switching behavior was scarcely observed in low-resistance state (LRS) as most of traps in the alpha-TiOx were filled with mobile ions such as O2- in LRS. The capture and emission processes of an electron at traps are largely divided into two groups: (1) both capture and emission processes are mainly affected by electric field; and (2) one of the capture and emission processes is only influenced by the thermal process. This paper provides fundamental physics required to understand the mechanism of RTNs in alpha-TiOx-based bipolar RRAMs.

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