Results are presented on the ablation by 157 nm laser radiation of polytetrafluoroethylene (PTFE), polyimide, polyhydroxybutyrate (PHB), poly(methyl methacrylate) (PMMA), and poly(2-hydroxyethyl methacrylate) with 1% of ethylene glycol dimethacrylate as a crosslinking monomer. Direct photoetching of PHB and undoped PTFE is demonstrated for laser fluences ranging from 0.05 to 0.8 J/cm2. The dependence of the ablation process on the polymer structure is analyzed, and insight into the ablation mechanism is gained from an analysis of the data using Beer–Lambert’s law and the kinetic model of the moving interface. Consideration of the absorbed energy density required to initiate significant ablation suggests that the photoetching mechanism is similar for all the polymers studied.

Optical lithography is being pushed into a regime of extreme-numerical aperture (extreme-NA). The implications of the nonscalar effects of high-NA lithography (above 0.50) have been discussed now for many years 1 . This paper considers the consequences of imaging at numerical apertures above 0.70 with the oblique imaging angles required for low k 1 lithography. A new scaling factor, k NA , is introduced to capture the impact of low k 1 imaging combined with extreme-NA optics. Extreme-imaging is defined as k 1 and k NA values approach 0.25. Polarization effects combined with resist requirements for extreme-NA are addressed, especially as they relate to 157nm lithography. As these technologies are pursued, careful consideration of optical and resist parameters is needed. Conventional targets for resist index, absorption, diffusion, and reflectivity based on normal incidence imaging may not lead to optimum performance without these considerations. Additionally, methods of local and semi-local mask polarization are discussed using concepts of wire-grid polarizer arrays. Back-side and image-side polarization OPC methods are introduced.

Mass-adoption of thin-film silicon (TF-Si) photovoltaic modules as a renewable energy source can be viable if the cost of electricity production from the module is competitive with conventional energy solutions. Increased module performance (electrical power generated) is an approach to reduce this cost. Progress towards higher conversion efficiencies for 'champion' large area modules paves the way for mass-production module performance to follow. At TEL Solar AG, Trübbach, Switzerland, significant progress in the absolute stabilized module conversion efficiency has been achieved through optimized solar cell design that integrates high-quality amorphous and microcrystalline TF-Si-deposited materials with efficient light management and transparent conductive oxide layers in a tandem MICROMORPH ™ module. This letter reports a world record large area (1.43 m 2 ) stabilized module conversion efficiency of 12.34% certified by the European Solar Test Installation; an increase of more than 1.4% absolute compared with the previous record for a TF-Si triple junction large area module. This breakthrough result generates more than 13.2% stabilized efficiency from each equivalent 1 cm 2 of the active area of the full module.

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