157-nm lithography with high numerical aperture lens for sub-70 nm node

Nanostructures Replicated by Polymer Molding

“…The lateral dimensions of the structures that can be patterned by photolithography are limited by the wavelength of the illumination source; state-of-the-art, 157-nm sources can fabricate features as small as 50 nm. [22] The techniques for making masters and for sub-100-nm photolithography require specialized, expensive equipment; such equipment is readily accessible in industry, but is not commonly available in academic research laboratories.…”

Continuous writing technique of long gratings for metrological applications

“…This represents a big challenge for manufacturing technologies. Whereas electron beam pattern generators [3] as well as step & repeat cameras [4] can, or will be able to print feature sizes under 100 nm, the patternable area remains limited to 12 inches. Near field holography is a 1/1 mask transfer technology, which is less limited in substrate size and has the potential of printing periods down to the required size [5].…”

Nanostructured back reflectors for improved light absorption in silicon thin film solar cells

“…Before solving, the structure is divided into many smaller domains called finite elements or meshes. For those finite elements, triangular elements are used for two [25], [26]. However, it allows one to fabricate periodic nanostructures, which are regular and up to a few hundreds of micrometer, at a much lower cost and using simpler process steps.…”

“…Polystyrene (PS) sphere assited lithography, which is also known as one of the colloidal lithography or natural lithography techniques [22], [23], is a promising cost-effective fabrication tool for producing regular and homogenous arrays of nanostructures with different sizes [24]. This techinique is not as precise as standard photolithography techniques, such as deep Ultra-Violet (UV) or extreme UV lithography [25], [26]. However, it allows one to fabricate periodic nanostructures, which are regulated up to a few hundreds of micrometers, with a much lower cost and simpler process steps.…”