SYNOPSISExperimental results on plasma treatments of polysulfone and polyetherimide to improve the wettability of these polymers are presented. The plasma is characterized by optical emission spectroscopy. The wettability of the polymer surfaces were checked by contact angle measurements and ESCA is used to compare the surfaces before and after plasma treatment. Correlations between contact angle, concentration of oxygen at the surface, and optical emission intensity of the OH radical have been established. Optimization of operational plasma parameters leading to the best wettability of the treated samples is reported. I NTRO D U CTlO NIn many technical applications, the desired surface and volume properties are not the same. Hence, it becomes difficult for a single material to fit both surface and volume requirements. At least for this reason, surface treatment and surface modification of polymeric materials is a domain of growing interest. Purely chemical, ' purely physical, and combined physical and ~h e m i c a l~'~ processes have been used to modify the surface of a polymer. In the last group, plasma techniques seem to be very powerful because it is a low-temperature treatment, applicable to a large variety of materials, and able to change the surface properties to a large extent (e.g., from wettability to impermeabilisation ) . 5 The main drawbacks of this technique are:1. The transfer from a small experimental setup to a large reactor fitting the real size and geometry of the items considered is not a simple homothetie. 2. A good understanding of the interactions between plasma species and treated surfaces, necessary to have a good control on the plasma parameters, is often very difficult to achieve.This article deals with the latter aspect. It is an attempt to establish relationships between three sets of parameters: ( 1 ) macroscopic parameters of the plasma (pressure, power, geometrical parameters) ; ( 2 ) composition of the gas phase with particular attention to the species responsible for surface modifications; and ( 3 ) composition and properties of the surface after plasma treatments.The first set of parameters is experimentally fixed during the plasma treatment. The plasma gas phase composition was checked by optical emission spectroscopy; the changes in surface composition were controlled by ESCA measurements. The surface wettability was evaluated by contact angle method, while the hydrophilic properties were determined by Hamilton's method.6From a technological point of view, the aim of this work is to show how a plasma process has been optimized to give the best wettability of two polymers-polysulfone ( PS ) and polyetherimide (PEI) -which are of great interest to make ultrafiltration and microfiltration membranes. Of course, in this case, wettability is one of the most important surface properties for these polymers.

SYNOPSISCold remote nitrogen plasma (CRNP) selectively reacts with silane-terminated organosiloxane compounds such as 1.1.3.3-tetramethyldsiloxane to give polymeric layers. Deposition rate measurements, FT-IR and Raman spectroscopy were performed. The chemical composition of the deposited film is closely dependent on the reactive gas composition and its flowing conditions. An original effect of dioxygen addition in the nonionic reactive media is pointed out: dioxygen addition leads to a fast and highly hydrocarbonated polymer formation with a nitrogen fixation in a silazane structure. Polymerization is described by a model where E S i -0 . type of radicals are the critical reactant. A global mechanism is proposed involving active species of the CRNP in initiation step of hydrogen abstraction and the nitrogen triplet state molecule N2(A 3 C ) in methyl abstraction on S S i . type of free radical. Dioxygen adjunction appears to limit the methyl abstraction steps. The efficient direct oxygen reaction on free radicals leads to an increase of the =Si -0' radical density and, consequently of the average length of the growing polymeric fragments. Nitrogen fixation, involving oxygenated species, is discussed. Under defined conditions, a highly hydrophobic polymeric film is obtained with a volumic mass of 1.34 g/cm3 and a deposition rate of about 12 mg/cm2 h corresponding to a growth rate of 200 A/s. 0 1994 John Wiley & Sons, Inc.

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Cold remote nitrogen plasma (CRNP) process is used to deposit organosiloxane polymeric films. 1,1,3,3-tetramethyldisiloxane (TMDS) or its mixture with oxygen is used to deposit polymeric layers on a rubber disks at ambient temperature. The deposited films appear to be efficient against chemical agents diffusion from the disks to a distilled water surrounding phase. The barrier efficiency is increased for films deposited from a TMDS/O 2 mixture. The extracted quantity of Zn // after 30 days of immersion in distilled water at ambient temperature is 70% lower in comparison to the uncoated ones. The transfer of Zn // into a liquid phase for coated disks is also discussed.