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Electron beam lithography presents a great opportunity for bit-patterned media (BPM) applications due to its resolution capability and placement accuracy. However, there are still many challenges associated with this application including tool availability, resist capability, process development, and associated metrology needs. This paper will briefly discuss these challenges and show the results of sub-25 nm pitch (1 Tdots∕in.2) patterning from both a simulation and experimental perspective. The simulation results indicate that the energy contrast between the exposed and unexposed areas goes down quickly as the pitch size gets smaller and smaller, making it more difficult for image formation of high-resolution dot patterning. The strategy to overcome this issue is to optimize the development process, which aims at increasing the resist contrast and enlarging the process window. By using this approach, the authors have successfully demonstrated a pitch resolution down to 18 nm for a positive-tone resist ZEP520 and 12 nm for a negative-tone resist silsesquioxane, corresponding to the areal density of ∼2.0 and ∼4.5 Tdots∕in.2, respectively. Using the ZEP520 resist process, a Cr dot array with a pitch of 21 nm (∼1.5 Tdots∕in.2) for template fabrication is demonstrated. High-quality scanning electron microscopy and atomic force microscopy images were used as primary metrology for both the dot size uniformity and the placement accuracy analysis.

Heat-assisted magnetic recording (HAMR), also known as hybrid recording, has been proposed to enable storage densities greater than 1 Tb/in 2 in hard disc drives while circumventing the superparamagnetic limit. Light is delivered in the near field to the recording medium to heat just the spot which is to be recorded. Techniques based on apertures, antennas, waveguides, and solid immersion lenses have been suggested for delivering substantial amounts of optical power into subwavelength spots in the near field. A practical transducer for HAMR may require a combination of techniques.

A new reflected mode magneto-optic spatial light modulator (R-MOSLM) has been developed for miniature optical correlators and computers. A factor of 4 improvement in pixel switching sensitivity, compared to the conventional transmission mode magneto-optic spatial light modulator, has been achieved by the use of narrower drive lines, and burying the conductor into the film. A factor of 3 higher resolution and a factor of 2 higher optical efficiency have also been achieved by the use of smaller pixels and narrower pixel gaps. The smaller pixels and improved switching sensitivity permit an order of magnitude reduction in optical path length and increase in frame rate, respectively. The progress that has been made in the design of the R-MOSLM, issues concerning its fabrication, a comparison by finite element analysis of field modeling to experimentally determined current requirements to drive individual lines, and some optical characteristics are discussed.

In this paper we present experimental heat assisted magnetic recording results using a planar solid immersion mirror (PSIM) fabricated on an Al2O3–TiC slider. The heads were flown at a velocity of 14 m/s, 20–25 nm above a Co/Pt multilayer medium which was deposited on a 60 mm glass disk. It was found that the track width and carrier-to-noise-ratio (CNR) increased with the applied magnetic field. Recording experiments were also performed with PSIMs terminated with 125 µm apertures. This led to narrower tracks and smaller CNR values for the same applied fields compared to recording with a PSIM only.