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Theoretical and experimental investigations have been made of the three-dimensional microchannel fabrication of photostructurable glass by use of a femtosecond (fs) laser. Generally, a microchannel fabricated inside glass by the scanning focal spot of a fs laser perpendicular to the direction of laser propagation assumes an elliptical shape with a cross section of large aspect ratio. We demonstrate that one can greatly reduce the aspect ratio merely by inserting a slit, which is oriented parallel to the laser's scanning direction, before the focusing lens. Computer simulations show that a more symmetrical pattern is obtained in the vicinity of the focal point with the help of such a slit, owing essentially to a diffraction effect.

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Photoetching of polymethyl methacrylate (PMMA) for pulsed high power UV light is demonstrated. As a high power UV light source, a KrF excimer laser was used. Etching depth obtained by deep UV light irradiation has not only energy dependence, but also power dependence. It increased abruptly by increasing the exposed power density for the same exposed energy density.These experimental results show that high power excimer lasers are the effective light source for UV photoetching of PMMA.

We show that three-dimensional micro-optical components can be embedded in a photosensitive glass by a femtosecond (fs) laser. After exposure to the tightly focused fs laser beam, latent images are written inside the sample. Modified regions are developed by a postbaking process and then preferentially etched away in a 10%-dilute solution of hydrofluoric acid. After this process, hollow internal structures are formed that act as a mirror and a beam splitter. Furthermore, we find that postannealing smoothes the surfaces of the fabricated hollow structures, resulting in great improvement of their optical properties.