Plasma produced by a 355 nm pulsed Nd:YAG laser with a pulse duration of 6 ns focussed onto a copper solid sample in air at atmospheric pressure is studied spectroscopically. The temperature and electron density characterizing the plasma are measured by time-resolved spectroscopy of neutral atom and ion line emissions in the time window of 300-2000 ns. An echelle spectrograph coupled with a gated intensified charge coupled detector is used to record the plasma emissions. The temperature is obtained using the Boltzmann plot method and the electron density is determined using the SahaBoltzmann equation method. Both parameters are studied as a function of delay time with respect to the onset of the laser pulse. The results are discussed. The time window where the plasma is optically thin and is also in local thermodynamic equilibrium (LTE), necessary for the laser-induced breakdown spectroscopy (LIBS) analysis of samples, is deduced from the temporal evolution of the intensity ratio of two Cu I lines. It is found to be 700-1000 ns.

We have made and characterized a new, erbium-doped tellurite glass that has high glass transition temperature. Addition of phosphate is found to increase the phonon energy. The peak emission cross section is 6 x 10(-21) cm(2) at 1537 nm and the fluorescence lifetime of the (4)I(13/2)-(4)I(15/2) transition is 4.1 ms. We have written 2-D channel waveguides in this glass using focused, 45-fs pulses from an amplified Ti:sapphire laser at different laser energies and writing speeds. Migration of atoms towards the periphery of the waveguides occurs, leading to refractive index changes. Channels show waveguiding at 1310 nm which is promising for the fabrication of integrated lasers and broadband amplifiers.

The authors report a numeric simulation tool that they developed for the modeling and analysis of electron beam lithography (EBL) of nanostructures employing a popular positive tone resist polymethylmethacrylate (PMMA). Modeling and process design for EBL fabrication of 5–50 nm PMMA structures on solid substrates is the target purpose of the simulator. The simulator is functional for exposure energies from 1 to 50 keV with arbitrary writing geometries. The authors employ a suite of kinetic models for the traveling of primary, secondary, and backscattered electrons in the resist, compute three-dimensional (3D) distributions of the yield of main-chain scission in PMMA, and convert these into the local volume fractions of fragments of various sizes. The kinetic process of development is described by the movement of the resist-developer interface with the rate derived from the mean-field theory of polymer diffusion. The EBL simulator allows the computation of detailed 3D distributions of the yield of main-chain scission in PMMA for various conditions of exposure, the corresponding volume fractions of small fragments, and the clearance profiles as functions of the development in time and temperature. This article describes the models employed to simulate the EBL exposure and development, reports examples of the computations, and presents comparisons of the predicted development profiles with experimental cross-sectional resist profiles in dense gratings.

No abstract

Laser-Induced Breakdown Spectroscopy (LIBS) is well recognized as a promising tool for in situ/remote elemental analysis of environmental, archeological, clinical, and hazardous samples. With the aim of quantifying trace elements in such samples, using LIBS technique, an echelle spectrograph-ICCD system with high sensitivity and good resolution has been assembled. Various important parameters of this system were studied and optimized. Conditions for getting good quality LIBS spectra and signal for multielemental analysis have been achieved, and these are discussed and illustrated in this paper.