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A new source for the generation of overdense plasma is developed using an electron cyclotron resonance (ECR) technique in a rectangular waveguide by a high-power (1 kW) microwave of frequency 2.45 GHz. The characteristics of the plasma for Ar gas are presented, including a large surface area to fill the entire waveguide of length 100 cm with uniformity ±3% over 50 cm. With the help of a Langmuir probe, plasma density about 1012 cm−3 and electron temperature of 8–12 eV are observed, and their dependence on the background gas pressure and magnetic field are also examined. It is shown that these parameters can be controlled by adjusting the gas pressure, magnetic fields, and/or microwave power. Such a plasma could be useful in plasma processing and in background plasma for the concept of plasma-based particle accelerators as well.

A new production technique of sheet-shaped plasma by means of electron cyclotron resonance heating (ECRH) is proposed. The sheet plasma is produced in a vessel with rectangular cross section set in a rectangular magnetic field coil. The maximum density and electron temperature of the sheet plasma are about 2.6×1011 cm−3 and 7 eV, respectively, in a typical argon gas pressure of P0=5×10−4 Torr. The sheet plasma has several peaks of the density profile across the plasma width. These modes appear according to the change of working gas pressure. Those parameters including plasma density, density profile, and ion energy are controllable. This plasma is expected to be useful for material processing or plasma-based high-energy particle accelerators.

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