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In this paper, the effect of angstrom-thick atomic layer deposited (ALD) ZnO embedded layer on photovoltaic (PV) performance of Nanowire-Based All-TiO 2 solar cells has been systematically investigated. Our results indicate that by varying the thickness of ZnO layer the efficiency of the solar cell can be significantly changed. It is shown that the efficiency has its maximum for optimal thickness of 1 ALD cycle in which this ultrathin ZnO layer improves device performance through passivation of surface traps without hampering injection efficiency of photogenerated electrons. The mechanisms contributing to this unprecedented change in PV performance of the cell have been scrutinized and discussed.

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Porous TiO 2 films were deposited on glass and ITO coated glass substrates by spin coating for spinning rates of 2000, 5000, 2000 followed by successive run of 5000 rpm (2000-5000). The AFM, SEM, XRD and UV-Vis analysis of the films coated on bare glass substrates for individual and 2000-5000 rpm runs showed amorphous and crystalline behaviours respectively, while TiO 2 films deposited on ITO/Glass substrates show crystalline structure. Both substrate nature and thickness of the films influence the formation of the crystallinity of the films. Also AFM images reveal that the roughness values of the films are independent of substrate.