Monoclinic tungsten trioxide coatings were deposited on fluorine doped tin dioxide glass substrate using a low pressure chemical vapor deposition system at 400 • C. Morphology analysis indicated the agglomeration of grains for 50 sccm O 2 flow rate, while for higher flow rates, the growth of islands which tend to coalescence to form a continuous film is observed. The electrochemical performance for the as-grown coating using 75 sccm O 2 flow rate was similar with the one for 100 sccm presenting stability up to 500 scans. The samples indicated Li + intercalated charge of 16 mC cm −2 , time response of 43 s and a coloration efficiency of 38 cm −2 C −1 .

Tungsten trioxide coatings were grown on fluorine doped tin dioxide glass substrate at 465 oC by low pressure chemical vapor deposition. Monoclinic tungsten oxide with low crystallinity containing agglomeration of grains was obtained irrespective of the O2 flow rate utilized. It was only observed an increase of grain size to 75 from 25 nm as the O2 raised to 100 from 25 sccm. In addition, the current density was similar among the samples irrespective of the growth conditions performed. Finally, the coloration efficiency was estimated to be 83 cm2 C‐1 at 670 nm, which is higher than other grown samples using greater deposition temperatures. (© 2015 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)