We design a narrowband polarization independent transmission guided mode resonance filter whose center wavelength is tunable with respect to the angle of incidence. The device is composed of two identical structures assembled back to back. Each half structure is a dielectric multilayer stack in which a grating is engraved. This so-called 2×1D crossed gratings component has already been demonstrated for reflection filtering [Opt. Lett.36, 1662 (2011)OPLEDP0146-959210.1364/OL.36.001662; Opt. Lett.39, 6038 (2014)OPLEDP0146-959210.1364/OL.39.006038]. The functioning in transmission requires the use of a high index material for the grating bumps. For the design, we resort to a clustering global optimization algorithm, used for the first time to our knowledge for grating structures. We demonstrated two filters with a quality factor of about 4000, tunable over more than 15 nm when the angle of incidence varies over a range of 4°, and with a transmittivity at resonance greater than 95% whatever the incident polarization.

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Due to its independency to the substrate used, Soft mold NanoImprint Lithography (S-NIL) is a technique of great interest in particular for the fabrication of optical devices. We demonstrate a mature pathway for the realization of optical filters from the conception to the optical characterization. Those filters can be realized on large surfaces (up to 6'' diameter wafers) with high conformity on various substrates. Quality of the transfer will be discussed throughout the process and optical performances compared to those obtained with classical techniques. In this paper we fabricated tunable spectral filters with a grating periodicity down to 260 nm and imprint surfaces up to 6''. Physical conformity of the gratings will be discussed in terms of long-range stitching obtained on 6'' Si hard mold, dimensional shrinkage during thermal NanoImprint on Zeonor® soft mold and conformity towards patterned hard mold throughout the process.

Due to its independency to the substrate used, Soft mold NanoImprint Lithography (S-NIL) is a technique of great interest in particular for the fabrication of optical devices. We demonstrate a mature pathway for the realization of optical filters from the conception to the optical characterization. Those filters can be realized on large surfaces (up to 6'' diameter wafers) with high conformity on various substrates. Quality of the transfer will be discussed throughout the process and optical performances compared to those obtained with classical techniques. In this paper we fabricated tunable spectral filters with a grating periodicity down to 260 nm and imprint surfaces up to 6''. Physical conformity of the gratings will be discussed in terms of long-range stitching obtained on 6'' Si hard mold, dimensional shrinkage during thermal NanoImprint on Zeonor® soft mold and conformity towards patterned hard mold throughout the process.

No abstract