Soft mold NanoImprint Lithography: a versatile tool for sub-wavelength grating applications

Abstract

Due to its independency to the substrate used, Soft mold NanoImprint Lithography (S-NIL) is a technique of great interest in particular for the fabrication of optical devices. We demonstrate a mature pathway for the realization of optical filters from the conception to the optical characterization. Those filters can be realized on large surfaces (up to 6'' diameter wafers) with high conformity on various substrates. Quality of the transfer will be discussed throughout the process and optical performances compared to those obtained with classical techniques. In this paper we fabricated tunable spectral filters with a grating periodicity down to 260 nm and imprint surfaces up to 6''. Physical conformity of the gratings will be discussed in terms of long-range stitching obtained on 6'' Si hard mold, dimensional shrinkage during thermal NanoImprint on Zeonor® soft mold and conformity towards patterned hard mold throughout the process.

Second-harmonic-generation enhancement in cavity resonator integrated grating filters

“…The Si 3 N 4 was deposited by Inductively Coupled Plasma Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) at low temperature (100 • C). The CRIGF was then patterned by soft-mold nano-imprint lithography [30] and etched in the Si 3 N 4 layer by Reactive Ion Etching (RIE). The topmost LiNbO 3 layer acted as a stop-etch, resulting in smooth and homogenous grating, as confirmed by AFM measurements.…”

Sub-100 nm feature sizes realized by cost-effective microscope projection photolithography

“…However, these techniques always require complex and expensive systems and the structuring processes are rather slow. Other techniques such as nanoimprint lithography also attracts great attention due to their high throughput capabilities [18][19][20][21] . As the master stamp used for this process usually needs to be produced via electron or ion beam lithography.…”

Integration of UV-nanoimprint lithography with two-photon polymerization for scalable production

“…Nanoimprint lithography (NIL), which is a lithographic technique for replication of high-resolution, large-area and highaspect-ratio features, is assumed to be a potentially parallel technology for high-throughput mass production [22][23][24] . To successfully implement NIL process, a master mold is needed for the replication.…”