A flat epitaxial silver film on a gallium arsenide [GaAs(110)] surface was synthesized in a two-step process. Deposition of a critical thickness of silver at low temperature led to the formation of a dense nanocluster film. Upon annealing, all atoms rearranged themselves into an atomically flat film. This silver film has a close-packed (111) structure modulated by a "silver mean" quasi-periodic sequence. The ability to grow such epitaxial overlayers of metals on semiconductors enables the testing of theoretical models and provides a connection between metal and semiconductor technologies.
We report an innovative approach that combines nanopatterning and nanomaterials synthesis with traditional silicon micromachining technologies for large-scale fabrication of carbon nanotube (CNT) probe tips for atomic force microscopy imaging applications. Our batch fabrication process has produced 244 CNT probe tips per 4-in. wafer with control over the CNT location, diameter, length, orientation, and crystalline morphology. CNT probe tips with diameters ranging between 40 and 80 nm and lengths between 2 and 6 µm are found to be functional probe tips with no need for shortening. This reliable and true bottom-up wafer scale integration and fabrication process provides a new class of high performance nanoprobes. Preliminary AFM imaging results show that the CNT probe tips are strong, wear-resistant, and capable of highresolution and critical-dimension imaging.
We show a direct determination of the charge state of surface As vacancies on p-type GaAs͑110͒ using scanning tunneling microscopy. This method utilizes the compensation between the local band bending resulting from the As vacancy and the p-type dopant whose charge states are known a priori. Detailed analysis shows a one-to-one compensation between the dopant-related and As-vacancy-related features, indicating that the As vacancy has a charge of ϩ1. This method can be extended to determine quantitative charge states of other point defects ͑positive or negative͒.
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