Due to the potential importance and usefulness, usage of highly ordered nanoporous anodized aluminum oxide can be broadened in industry, when highly ordered anodized aluminum oxide can be placed on a substrate with controlled thickness. Here we report a facile route to highly ordered nanoporous alumina with the thickness of hundreds-of-nanometer on a silicon wafer substrate. Hexagonally or tetragonally ordered nanoporous alumina could be prepared by way of thermal imprinting, dry etching, and anodization. Adoption of reusable polymer soft molds enabled the control of the thickness of the highly ordered porous alumina. It also increased reproducibility of imprinting process and reduced the expense for mold production and pattern generation. As nanoporous alumina templates are mechanically and thermally stable, we expect that the simple and costeffective fabrication through our method would be highly applicable in electronics industry.

Nano-structured polymer stamps were prepared from porous anodic alumina templates. Prepolymers were poured onto the highly ordered porous anodic alumina templates, and they were cured by UV-irradiation. Simple separation of the elastic stamp from the nanoporous aluminum oxide leads to well replicated nano-stamps. The nanopatterns on the stamp were transferred as ultrahigh-density nanopore arrays on various substrates which are potentially applicable to the fabrication of ultrahigh-density metallic or semiconductor nanodot arrays for magnetic storage devices or display devices.

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