L.J. Chen scite author profile

The svucture and electrical properties of CVD-W films on various PVD or MOCVD TIN films have been investigated. The growth orientations of the TiN adhesion layers were controlled by deposition method and film thickness. The growth orientations of CVD-W films were found to depend strongly on the microstructures of TIN. The grain sizes and electrical resistivity of CVD-W were found to increase and decrease, respectively, with the grain sizes of underlying TiN layers.

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L.J. Chen

Characterization of multilayered Ti/TiN films grown by chemical vapor deposition

Properties of CVD-W overgrowth on PVD and MOCVD TiN layers

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