Recently, there has been growing interest in the incorporation of particles in plasma deposited thin films to creation of multifunctional surfaces. In this work a new hybrid methodology based on the plasma enhanced chemical vapor deposition (PECVD) of hexamethyldisiloxane combined to the reactive sputtering of TiO 2 is proposed for the preparation of SiO x C y H z -TiO 2 composite films. Specifically, the effect of the proportion of O 2 in the plasma environment on the morphology, chemical structure, elemental composition, wettability, thickness and surface roughness, of the films was studied. Agglomerates of TiO 2 (16-83 μm) were detected into the organosilicon matrix with the concentration of particulates growing with the percentage of oxygen in the feed. In general, there was elevation in the angle of contact of the surfaces as the oxygen supply increased. Interpretation is proposed in terms of the influence of the oxygen supply on the TiO 2 sputtering rate and in the oxidation of plasma species.
AZO thin films (around 200 nm thick) were grown on polyethylene terephthalate (PET) at room temperature. The plasma was activated using a 13.56 MHz (RF) or a 15 kHz pulsed (PMS) source at a power of 60 W. Optical reflection and transmittance were measured using a UV-Vis-NIR spectrometer over the wavelengths from 190 nm to 2500 nm. All samples show average transmittances greater than 83% in the visible region. The electrical resistivity was measured by the linear four-point probe method to be around 0.001 Ωcm for 200 nm-thick AZO films grown by PMS. XRD results indicated that the films had a hexagonal wurtzite structure and were preferentially oriented in the (002) plane. The surface morphology of the AZO thin films was characterized using Scanning Electron Microscopy (SEM); film chemical composition was studied using Energy Dispersive X-ray Spectroscopy (EDS). For this, an EDS coupled to the Scanning Electron Microscope was used. Only for films grown by PMS were no cracks observed.
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