We report on the development of a high-power laser plasma extreme ultraviolet (EUV) source for Extreme Ultraviolet Lithography. The source is based on the plasma emission of a recycled jet beam of large Xe clusters and produces no particulate debris. The source will be driven by a pulsed laser delivering 1500 W of focused average power to the cluster jet target. To develop condensers and to optimize source performance, a low-power laboratory cluster jet prototype has been used to study the spectroscopy, angular distributions, and EUV source images of the cluster jet plasma emission. In addition, methods to improve the reflectance lifetimes of nearby plasma-facing condenser mirrors have been developed. The resulting source yields E W conversion efficiencies up to 3.8 % and mirror lifetimes of -10' plasma pulses.
The magnitude of the oxygen isotope eff'ect in the high-T, superconductor YBa2Cu3O7 has been determined by substitution of ' O for ' O. A series of cross exchanges was performed on highquality polycrystalline specimens to eliminate uncertainties due to sample heat treatments and sample inhomogeneities.Magnetic measurements suggest a relative isotope shift for the bulk material of -0.17~0.03 K at 80%%uo ' 0 substitution, yielding ab"~k=0.019+ 0.004 where T, -M and M is the oxygen mass. Resistivity measurements in freshly prepared specimens reveal filamentary superconductivity 1 or 2 K above the bulk superconducting transition temperature. The isotope shift associated with the filamentary superconductivity is similar to but slightly larger than the bulk shift: af;~=0.028+ 0.003. The filamentary superconductivity is time dependent and disappears several months after sample preparation.We show that the above values of a are inconsistent with the standard three-dimensional phonon-mediated Bardeen-Cooper-Schriefer theory, and discuss implications for alternative possibilities.
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