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Electron Shading (ESj-effects were studied as a function of reactor-and transistor-type. It was found that the classical ES-effect, which occurs during the latent antenna regime, dominates for the current high-density plasma-reactors, independent of the used transistor-type.However, for less dense plasma-reactors the socalled extended ES-effect, which occurs during the overetch regime, can ovemle the classicai ES-effect depending on the transistor-type.